Company Filing History:
Years Active: 2000
Title: Chi-Cheng Yang: Innovator in Semiconductor Fabrication
Introduction
Chi-Cheng Yang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative methods for creating vias. His work is essential in advancing the technology used in electronic devices.
Latest Patents
Chi-Cheng Yang holds a patent for a "Method for fabricating a via." This method utilizes a hard etching mask for etching the via, which enhances the precision and efficiency of the fabrication process. The process involves removing a photoresist layer used to pattern the hard etching mask before commencing the via etching. The hard etching mask comprises a TiN etching mask, a silicon nitride etching mask, and an oxide/TiN etching mask. Notably, the TiN etching mask does not necessarily need to be removed after etching, while the silicon nitride etching mask is removed post-etching. The oxide layer in the oxide/TiN etching mask serves as a sacrificial layer, further optimizing the fabrication process. Chi-Cheng Yang has 1 patent to his name.
Career Highlights
Chi-Cheng Yang is currently employed at United Semiconductor Corporation, where he continues to innovate in semiconductor technologies. His expertise in the field has positioned him as a valuable asset to the company and the industry at large.
Collaborations
Chi-Cheng Yang has worked alongside talented colleagues, including William Lu and Tsung-Yuan Hung. Their collaborative efforts contribute to the advancement of semiconductor technologies and innovations.
Conclusion
Chi-Cheng Yang's contributions to semiconductor fabrication through his patented methods demonstrate his commitment to innovation in the field. His work not only enhances the efficiency of manufacturing processes but also plays a crucial role in the development of modern electronic devices.