Company Filing History:
Years Active: 2025
Title: Chetana Singh: Innovator in Extreme Ultraviolet Lithography
Introduction
Chetana Singh is a prominent inventor based in Portland, OR (US). She has made significant contributions to the field of semiconductor technology, particularly in extreme ultraviolet lithography. Her innovative work has led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Chetana Singh holds a patent for "Extreme ultraviolet lithography patterning with assist features." This patent discloses techniques for improved extreme ultraviolet (EUV) patterning using assist features, related transistor structures, integrated circuits, and systems. The invention involves patterning a number of semiconductor fins and assist features into a semiconductor substrate using EUV. The assist features increase the coverage of absorber material in the EUV mask, thereby reducing bright field defects in the EUV patterning. The semiconductor fins and assist features are buried in fill material, and a mask is patterned that exposes the assist features while covering the semiconductor fins. The exposed assist features are partially removed, and the protected active fins are ultimately used in transistor devices.
Career Highlights
Chetana Singh is currently employed at Intel Corporation, where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in developing techniques that improve the manufacturing processes of integrated circuits. With her expertise, she has contributed to the advancement of technology that is crucial for modern electronics.
Collaborations
Chetana has collaborated with notable colleagues, including Leonard P. Guler and Tahir Ghani. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.
Conclusion
Chetana Singh is a trailblazer in the field of extreme ultraviolet lithography, with a patent that showcases her innovative spirit and technical expertise. Her contributions to Intel Corporation and the semiconductor industry are noteworthy and continue to influence the future of technology.