Cheonil Park

Title: Cheonil Park: Innovator in Semiconductor Fabrication

Introduction

Cheonil Park is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the methods of fabricating semiconductor devices.

Latest Patents

Cheonil Park holds a patent for a "Method of fabricating semiconductor device and method of separating substrate." This patent discloses innovative methods for fabricating semiconductor devices, which include providing a release layer between a carrier substrate and a device substrate. The process involves irradiating the carrier substrate with ultraviolet rays to separate it from the release layer, thereby exposing one surface of the release layer. A cleaning process is then performed to reveal the first surface of the device substrate. The release layer is composed of an aromatic polymerization unit and a siloxane polymerization unit. He has 1 patent to his name.

Career Highlights

Cheonil Park is associated with Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has positioned him as a key player in advancing semiconductor technologies.

Collaborations

Throughout his career, Cheonil Park has collaborated with notable colleagues, including Wonkeun Kim and Myoungchul Eum. These collaborations have contributed to the development of innovative solutions in semiconductor fabrication.

Conclusion

Cheonil Park's contributions to semiconductor technology through his patent and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor device fabrication.