The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Feb. 01, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Cheonil Park, Seongnam-si, KR;

Wonkeun Kim, Hwaseong-si, KR;

Myoungchul Eum, Asan-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B32B 7/12 (2006.01); B32B 38/16 (2006.01); B32B 43/00 (2006.01); C09J 7/40 (2018.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); B32B 7/12 (2013.01); B32B 38/162 (2013.01); B32B 43/006 (2013.01); C09J 7/401 (2018.01); H01L 21/6836 (2013.01); B32B 2310/0831 (2013.01); B32B 2457/00 (2013.01); C09J 2203/326 (2013.01); C09J 2483/005 (2013.01);
Abstract

Disclosed are methods of fabricating semiconductor devices and methods of separating substrates. The semiconductor device fabricating method comprises providing a release layer between a carrier substrate and a first surface of a device substrate to attach the device substrate to the carrier substrate, irradiating the carrier substrate with an ultraviolet ray to separate the carrier substrate from the release layer and to expose one surface of the release layer, and performing a cleaning process on the one surface of the release layer to expose the first surface of the device substrate. The release layer includes an aromatic polymerization unit and a siloxane polymerization unit.


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