Anseong, South Korea

Cheong Hwan Jeong

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignees: Wonik Ips Co., Ltd., Wonik Ips Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cheong Hwan Jeong. Retrieved from https://idiyas.com/inventor/cheong-hwan-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Cheong Hwan Jeong: Innovator in Substrate Processing Technology

Introduction: Cheong Hwan Jeong is a notable inventor based in Anseong-si, Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique substrate processing apparatus.

Latest Patents: Cheong Hwan Jeong holds 1 patent for his invention titled "Substrate Processing Apparatus." This invention focuses on a substrate processing apparatus designed to operate under both high and low pressure conditions. The apparatus features a process chamber with a chamber body that includes an installation groove for substrate placement, along with a gate for loading and unloading substrates.

Career Highlights: Throughout his career, Cheong Hwan Jeong has demonstrated a commitment to advancing substrate processing technologies. His work has been instrumental in enhancing the efficiency and effectiveness of substrate processing methods.

Collaborations: Cheong Hwan Jeong has collaborated with talented individuals in his field, including coworkers Tae Dong Kim and Jung Hwan Lee. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion: Cheong Hwan Jeong's contributions to substrate processing technology exemplify the spirit of innovation. His patent for the substrate processing apparatus showcases his ability to address complex challenges in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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