The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Sep. 01, 2022
Wonik Ips Co., Ltd., Pyeongtaek-si Gyeonggi-do, KR;
Tae Dong Kim, Osan-si Gyeonggi-do, KR;
Jung Hwan Lee, Osan-si Gyeonggi-do, KR;
Cheong Hwan Jeong, Anseong-si Gyeonggi-do, KR;
Sung Ho Roh, Yongin-si Gyeonggi-do, KR;
Young Jun Kim, Pyeongtaek-si Gyeonggi-do, KR;
WONIK IPS CO., LTD., Pyeongtaek-si, KR;
Abstract
The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus in which a substrate is processed at a high pressure and a low pressure. The substrate processing apparatus of the present invention includes: a process chamber () including a chamber body () which has an opened upper portion and in which an installation groove () is defined at a central side of a bottom surface () thereof, and a gate () configured to load/unload a substrate () is disposed at one side thereof, and a top lid () coupled to the upper portion of the chamber body () to define an inner space (S); a substrate support () installed to be inserted into the installation groove () of the chamber body () and having a top surface on which the substrate () is seated.