Company Filing History:
Years Active: 2025
Title: Innovations of Jung Hwan Lee in Substrate Processing Technology.
Introduction
Jung Hwan Lee is a notable inventor based in Osan-si, Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique substrate processing apparatus.
Latest Patents
Jung Hwan Lee holds a patent for a substrate processing apparatus. This invention relates to a substrate processing apparatus designed to operate at both high and low pressures. The apparatus includes a process chamber with an open upper portion, an installation groove defined at the central side of the bottom surface, and a gate for loading and unloading substrates. The design also features a top lid that defines an inner space, along with a substrate support that allows for efficient processing.
Career Highlights
Jung Hwan Lee is currently associated with Wonik Ips Co., Ltd., where he continues to innovate in substrate processing technologies. His work has been instrumental in advancing the capabilities of substrate processing equipment.
Collaborations
He collaborates with talented coworkers, including Tae Dong Kim and Cheong Hwan Jeong, who contribute to the innovative environment at Wonik Ips Co., Ltd.
Conclusion
Jung Hwan Lee's contributions to substrate processing technology exemplify the impact of innovation in the field. His patent and ongoing work continue to shape advancements in this area.