Osan, South Korea

Tae Dong Kim

This inventor holds 2 USPTO granted patents and 7 published patent applications. Top assignees: Wonik Ips Co., Ltd., Wonik Ips Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae Dong Kim. Retrieved from https://idiyas.com/inventor/tae-dong-kim-9k457rcg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 6.4

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Innovations of Tae Dong Kim in Substrate Processing Technology.

Introduction

Tae Dong Kim is a notable inventor based in Osan-si, Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique substrate processing apparatus.

Latest Patents

Tae Dong Kim holds a patent for a substrate processing apparatus. This invention relates to a substrate processing apparatus designed to operate at both high and low pressures. The apparatus includes a process chamber with an installation groove defined at the central side of its bottom surface. It features a gate for loading and unloading substrates, along with a top lid that defines the inner space of the chamber.

Career Highlights

Tae Dong Kim is associated with Wonik Ips Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of substrate processing technologies.

Collaborations

He collaborates with talented coworkers, including Jung Hwan Lee and Cheong Hwan Jeong, who contribute to the innovative projects at Wonik Ips Co., Ltd.

Conclusion

Tae Dong Kim's contributions to substrate processing technology exemplify the impact of innovation in the field. His patent and ongoing work continue to influence advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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