Chengyong He

Title: Chengyong He: Innovator in Photomask Technology

Introduction

Chengyong He is a notable inventor based in Beijing, China. He has made significant contributions to the field of photomask technology, which is essential in the manufacturing of semiconductors. His innovative approach has led to the development of a unique patent that enhances the efficiency of light transmission in photomasks.

Latest Patents

Chengyong He holds a patent for a photomask and exposure method. The patent describes a photomask that includes a body with a first surface and a second surface opposite each other. A first light-transmissive region penetrates through both surfaces, featuring a light adjustment component that converges a first light beam into a second light beam. Notably, the cross-sectional area of the first light beam is larger than that of the second light beam, optimizing the exposure process in photolithography.

Career Highlights

Throughout his career, Chengyong He has worked with prominent companies in the technology sector. He has been associated with BOE Technology Group Co., Ltd. and Chongqing BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in optoelectronic technologies.

Collaborations

Chengyong He has collaborated with several professionals in his field, including Yang Wang and Jun Yang. These collaborations have fostered innovation and have been instrumental in the development of new technologies in photomask applications.

Conclusion

Chengyong He is a distinguished inventor whose work in photomask technology has made a significant impact on the semiconductor industry. His innovative patent and collaborations highlight his commitment to advancing technology in this critical field.