Boe Technology Group Co., Ltd.

Chongqing Boe Optoelectronics Technology Co., Ltd.

Chengyong He

Xin Wang

Yang Wang

Can Zhang

Peng Cai

Jun Yang

Junwei Zhang

Xiaochen Cui

Jinxiang Li

Chunjie Wang

Xingming Wang

Guanzheng Li

A photomask and an exposure method are provided. The photomask includes a photomask body including a first surface and a second surface opposite to each other; and a first light-transmissive region penetrating through the first surface and the second surface, wherein a light adjustment component is in the first light-transmissive region and configured to converge a first light beam incident onto the first surface to a second light beam emergent from the second surface, and a cross-sectional area of the first light beam sectioned by the first surface is larger than that of the second light beam sectioned by the second surface.

Photomask and exposure method

Growing community of inventors

Beijing, China

Chengyong He