The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Aug. 21, 2018
Boe Technology Group Co., Ltd., Beijing, CN;
Chongqing Boe Optoelectronics Technology Co., Ltd., Chongqing, CN;
Chengyong He, Beijing, CN;
Yang Wang, Beijing, CN;
Jun Yang, Beijing, CN;
Xin Wang, Beijing, CN;
Guanzheng Li, Beijing, CN;
Jinxiang Li, Beijing, CN;
Xingming Wang, Beijing, CN;
Peng Cai, Beijing, CN;
Xiaochen Cui, Beijing, CN;
Junwei Zhang, Beijing, CN;
Can Zhang, Beijing, CN;
Chunjie Wang, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO..LTD., Chongqing, CN;
Abstract
A photomask and an exposure method are provided. The photomask includes a photomask body including a first surface and a second surface opposite to each other; and a first light-transmissive region penetrating through the first surface and the second surface, wherein a light adjustment component is in the first light-transmissive region and configured to converge a first light beam incident onto the first surface to a second light beam emergent from the second surface, and a cross-sectional area of the first light beam sectioned by the first surface is larger than that of the second light beam sectioned by the second surface.