Beijing, China

Guanzheng Li

USPTO Granted Patents = 1 

Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2021

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: Guanzheng Li: Innovator in Photomask Technology

Introduction

Guanzheng Li is a notable inventor based in Beijing, China. He has made significant contributions to the field of photomask technology, which is essential in the manufacturing of semiconductors. His innovative approach has led to the development of a unique patent that enhances the efficiency of light transmission in photomasks.

Latest Patents

Guanzheng Li holds a patent for a photomask and exposure method. This invention includes a photomask body with a first surface and a second surface that are opposite to each other. The photomask features a first light-transmissive region that penetrates through both surfaces. A light adjustment component is integrated within this region, designed to converge a first light beam incident on the first surface into a second light beam that emerges from the second surface. Notably, the cross-sectional area of the first light beam, as sectioned by the first surface, is larger than that of the second light beam, as sectioned by the second surface. This innovation is crucial for improving the precision of photolithography processes.

Career Highlights

Throughout his career, Guanzheng Li has worked with prominent companies in the optoelectronics industry. He has been associated with BOE Technology Group Co., Ltd. and Chongqing BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in photomask technology.

Collaborations

Guanzheng Li has collaborated with several professionals in his field, including Chengyong He and Yang Wang. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the optoelectronics sector.

Conclusion

Guanzheng Li's contributions to photomask technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and career achievements highlight his role as a key player in advancing optical technologies.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…