This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Chinese Academy of Sciences, Shanghai Simgui Technology Co., Ltd.. Active years: 2014-2016.
Location History:
- Shangha, CN (2014)
- Shanghai, CN (2016)
Company Filing History:
2 out of 3,332 
2 out of 9 Years Active: 2014-2016
Title: Chenglu Lin: Innovator in Semiconductor Substrate Technology
Introduction
Chenglu Lin is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the preparation of substrates with insulating layers. With a total of 2 patents, his work has advanced the methods used in semiconductor manufacturing.
Latest Patents
Chenglu Lin's latest patents include a "Method for preparing semiconductor substrate with insulating buried layer gettering process." This innovative method involves several steps, including providing a device substrate and a supporting substrate, forming an insulating layer, and performing a heating treatment to create a denuded zone. The process ensures that the insulating layer is effectively sandwiched between the device substrate and the supporting substrate, enhancing the bonding interface for subsequent processing.
Another notable patent is the "Method for forming substrate with buried insulating layer." This method outlines a procedure for creating an edge-chamfered substrate with a buried insulating layer. It includes steps such as forming an etching mask layer, chamfering the substrate, and bonding it to a second substrate. This approach effectively avoids edge collapses and maintains the warp degree during processing.
Career Highlights
Chenglu Lin has worked with esteemed organizations, including the Chinese Academy of Sciences and Shanghai Simgui Technology Co., Ltd. His experience in these institutions has allowed him to refine his expertise in semiconductor technologies and contribute to groundbreaking innovations.
Collaborations
Throughout his career, Chenglu Lin has collaborated with notable colleagues, including Xi Wang and Xing Wei. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Chenglu Lin's contributions to semiconductor substrate technology are noteworthy and impactful. His innovative methods and collaborations have positioned him as a key figure in the field, driving advancements that benefit the industry.