Cheng-Yang Pan

Title: Innovations by Cheng-Yang Pan in Semiconductor Technology

Introduction

Cheng-Yang Pan is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent that addresses challenges in semiconductor processing.

Latest Patents

Cheng-Yang Pan holds a patent for a "Wafer chuck for producing an inert gas blanket and method for using." This invention is designed for use in a semiconductor process chamber and is capable of producing an inert gas blanket positioned on the chuck from residual chemical vapor in the chamber. The wafer chuck features a plurality of mounting pins that support a wafer, forming a cavity between the wafer and the upper surface of the chuck. Additionally, it includes apertures in the sidewall of the body portion that allow for the flow of inert gas into the lower chamber, effectively blocking the passageway between the upper and lower chambers. This innovation prevents damage to the wafer from residual chemical vapor in the lower chamber.

Career Highlights

Cheng-Yang Pan is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has contributed to advancements in semiconductor manufacturing processes, enhancing the efficiency and safety of wafer handling.

Collaborations

Cheng-Yang has collaborated with notable colleagues such as Su-Yu Yeh and Huai-Tei Yang, further enriching the innovative environment within his workplace.

Conclusion

Cheng-Yang Pan's contributions to semiconductor technology through his patent demonstrate his commitment to innovation in the field. His work not only addresses critical challenges but also enhances the overall safety and efficiency of semiconductor manufacturing processes.