Cheng-Ming Lee

Title: Cheng-Ming Lee: Innovator in Semiconductor Technology

Introduction

Cheng-Ming Lee is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and dedication to advancing semiconductor structures have positioned him as a key figure in the industry.

Latest Patents

Cheng-Ming Lee holds a patent for an "Overhanging source/drain contact." This patent describes semiconductor structures and methods that include a first fin structure and a second fin structure over a substrate. The invention features a first source/drain feature disposed over the first fin structure and a second source/drain feature over the second fin structure. Additionally, a dielectric feature is placed over the first source/drain feature, and a contact structure is formed over both source/drain features. This contact structure is electrically coupled to the second source/drain feature and is separated from the first source/drain feature by the dielectric feature. He has 1 patent to his name.

Career Highlights

Cheng-Ming Lee is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to collaborate with some of the brightest minds in the industry. His contributions have been instrumental in developing advanced semiconductor technologies.

Collaborations

Some of his notable coworkers include Chung-Hao Cai and Yen-Jun Huang. Their collaborative efforts have further enhanced the innovative capabilities within their projects.

Conclusion

Cheng-Ming Lee's work in semiconductor technology exemplifies the spirit of innovation and collaboration in the field. His patent contributions and career at Taiwan Semiconductor Manufacturing Company Ltd. highlight his importance as an inventor.