Cheng-Hung Ku

Title: Innovations of Cheng-Hung Ku

Introduction

Cheng-Hung Ku is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of device fabrication through his innovative methods. His work focuses on enhancing the efficiency and accuracy of mask patterns used in manufacturing processes.

Latest Patents

Cheng-Hung Ku holds a patent for a "Method for establishing scattering bar rule." This method provides a systematic approach to creating a scattering bar rule for mask patterns used in device fabrication. The process begins with establishing at least one image simulation model based on the mask pattern and a reference set for the fabrication process. A variety of scattering bar reference sets are then applied to the simulation model, generating multiple simulation images. From these images, several candidate layouts are selected based on specific screening criteria. Ultimately, one candidate layout is chosen as the pattern layout, and the corresponding scattering bar reference set is identified as the scattering bar rule for the mask pattern.

Career Highlights

Cheng-Hung Ku is currently employed at Promos Technologies, Inc., where he continues to develop innovative solutions in the field of device fabrication. His expertise in image simulation and mask pattern design has positioned him as a valuable asset to his company.

Collaborations

Cheng-Hung Ku collaborates with talented colleagues such as Chun-Yu Lin and Chia-Jung Liou. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Cheng-Hung Ku's innovative methods and patent contributions significantly impact the device fabrication industry. His work exemplifies the importance of creativity and collaboration in technological advancements.