Redwood City, CA, United States of America

Cheng-Hsin Ma

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2013.


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Cheng-Hsin Ma in Lithography Technology

Introduction

Cheng-Hsin Ma is a notable inventor based in Redwood City, CA. He has made significant contributions to the field of lithography, particularly in the fabrication of high-resolution phase shift masks. His work is essential for advancing semiconductor manufacturing technologies.

Latest Patents

Cheng-Hsin Ma holds a patent for a high-resolution phase shift mask. This patent discloses techniques for fabricating lithography masks, which include a first level process comprising lithography and etching to form mask frames and in-die areas. The second level process involves lithography and etching to create one or more mask features in the in-die area. Notably, at least one of the mask features has a smallest dimension in the nanometer range, such as the 32 nm technology node or smaller. The techniques may be embodied in a lithography mask for fabricating semiconductor circuits. In one example, the mask includes a frame area and an in-die area formed after the frame area. The in-die area contains one or more mask features, with at least one feature having a smallest dimension of less than 100 nm. The mask boasts a critical dimension bias of less than 20 nm and comprises a substrate and an absorber layer.

Career Highlights

Cheng-Hsin Ma is currently employed at Intel Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in enhancing the precision and efficiency of lithography processes.

Collaborations

Cheng-Hsin Ma has collaborated with notable colleagues, including Chang Ju Choi and Sven Eric Henrichs. These collaborations have contributed to the advancement of lithography techniques and semiconductor manufacturing.

Conclusion

Cheng-Hsin Ma's contributions to lithography technology, particularly through his patent on high-resolution phase shift masks, highlight his role as an influential inventor in the semiconductor industry. His work continues to impact the field significantly.

Profile summary based on public USPTO records.
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