Tainan, Taiwan

Cheng-Hsien Chuang

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2016.


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Cheng-Hsien Chuang: Innovator in Semiconductor Technology

Introduction

Cheng-Hsien Chuang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of integrated circuit devices. His innovative approach has led to the development of a unique method that enhances the efficiency of semiconductor manufacturing.

Latest Patents

Chuang holds a patent for a method titled "Test structure placement on a semiconductor wafer." This patent describes a process that includes forming a plurality of spaced integrated circuit dies on a semiconductor wafer. Additionally, it involves creating a dedicated test die adjacent to these integrated circuit dies. The dedicated test die features a test structure that generates wafer evaluation data, which is crucial for assessing the quality of the semiconductor devices.

Career Highlights

Cheng-Hsien Chuang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has been instrumental in advancing the methodologies used in integrated circuit fabrication. With a focus on innovation, he continues to contribute to the evolution of semiconductor technologies.

Collaborations

Chuang has collaborated with esteemed colleagues such as Wang-Pen Mo and Hung-Chang Hsieh. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in semiconductor research.

Conclusion

Cheng-Hsien Chuang's contributions to semiconductor technology exemplify the spirit of innovation in the industry. His patent and collaborative efforts highlight the importance of continuous improvement in manufacturing processes. His work not only enhances the efficiency of semiconductor devices but also sets a foundation for future advancements in the field.

Profile summary based on public USPTO records.
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