Tucheng, Taiwan

Cheng-Chiech Huang

This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Innovations of Cheng-Chiech Huang

Introduction

Cheng-Chiech Huang is a notable inventor based in Tucheng, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of high surface area germanium (HSG) applications. His innovative approach has led to advancements that improve the quality and efficiency of semiconductor manufacturing processes.

Latest Patents

Cheng-Chiech Huang holds a patent titled "Method for preventing the cluster defect of HSG." This invention addresses the issue of cluster defects that occur when wafers with HSGs are cleaned immediately after their formation. The method involves applying a heat treatment to the HSGs before the cleaning process, which enhances the surface states of the HSGs. As a result, this innovative approach prevents the formation of clusters during subsequent cleaning, thereby improving the overall quality of HSG applications.

Career Highlights

Cheng-Chiech Huang is currently employed at United Microelectronics Corporation, a leading semiconductor foundry. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field. His contributions have been instrumental in advancing semiconductor technologies and improving manufacturing processes.

Collaborations

Cheng-Chiech Huang has worked alongside notable colleagues such as Kuo-Chi Lin and Da-Wen Hsia. Their collaborative efforts have fostered an environment of innovation and excellence within their projects.

Conclusion

Cheng-Chiech Huang's innovative methods and dedication to improving semiconductor technology have made a significant impact in the industry. His patent for preventing cluster defects in HSGs exemplifies his commitment to enhancing manufacturing processes. His work continues to influence the field and drive advancements in semiconductor applications.

Profile summary based on public USPTO records.
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