Singapore, Singapore

Cheng-Cheh Tan


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2011

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: Cheng-Cheh Tan: Innovator in Copper Interconnect Technology

Introduction

Cheng-Cheh Tan is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor technology. He has developed innovative solutions that enhance the reliability and performance of copper interconnects, which are critical components in modern electronic devices.

Latest Patents

Cheng-Cheh Tan holds a patent titled "Grain boundary blocking for stress migration and electromigration improvement in CU interconnects." This patent describes a structure and method for forming a copper interconnect that includes a doped region near the top surface. The doped region contains implanted alloying elements that effectively block grain boundaries, thereby reducing stress and electromigration. In one embodiment, a barrier layer is maintained over the intermetal dielectric layer during the alloying element implant, which is later removed through a planarization process. In another embodiment, the barrier layer is removed prior to the alloying element implant, with a hard mask preventing the alloying element from being implanted in the intermetal dielectric layer.

Career Highlights

Cheng-Cheh Tan is currently employed at Globalfoundries Singapore Pte. Ltd., where he applies his expertise in semiconductor manufacturing. His work focuses on improving the performance and reliability of interconnects, which are essential for the functionality of integrated circuits.

Collaborations

Cheng-Cheh Tan collaborates with talented colleagues, including Fan Zhang and Kho Liep Chok, who contribute to the innovative environment at Globalfoundries Singapore Pte. Ltd. Their teamwork fosters advancements in semiconductor technology.

Conclusion

Cheng-Cheh Tan's innovative work in copper interconnect technology exemplifies the importance of research and development in the semiconductor industry. His contributions significantly enhance the performance and reliability of electronic devices, making him a valuable figure in the field.

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