Cheng-An Chang

Title: Cheng-An Chang: Innovator in Semiconductor Fabrication

Introduction

Cheng-An Chang is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative approaches have enhanced the reliability and efficiency of semiconductor structures.

Latest Patents

One of Cheng-An Chang's latest patents is a fabrication method of semiconductor structure. This invention provides a comprehensive method for creating a semiconductor structure, which includes several key steps. The process begins with providing a chip that has conductive pads. A metal layer is then formed on these conductive pads, followed by the formation of a passivation layer on a portion of the metal layer. Finally, conductive pillars are created on the metal layer. This method effectively addresses the undercut problem by protecting the metal layer with the passivation layer, thereby increasing the supporting strength of the conductive pillars and improving product reliability.

Career Highlights

Cheng-An Chang is currently employed at Siliconware Precision Industries Co., Ltd., where he continues to develop innovative solutions in semiconductor fabrication. His work has been instrumental in advancing the technology used in the industry.

Collaborations

Cheng-An Chang has collaborated with notable colleagues, including Yi-Cheih Chen and Sung-Huan Sun. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Cheng-An Chang's contributions to semiconductor fabrication demonstrate his commitment to innovation and excellence in technology. His patents reflect a deep understanding of the challenges in the field and provide effective solutions that enhance product reliability.