Chen-Yu Wu

Title: Innovations of Inventor Chen-Yu Wu

Introduction

Chen-Yu Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on improving circuit designs and semiconductor processes, showcasing his expertise and innovative spirit.

Latest Patents

One of his latest patents is a terminal correction circuit. This circuit includes a first terminal replica model, a terminal voltage offset correction circuit, a second terminal replica model, and a terminal resistance offset correction circuit. The first terminal replica model sets a resistance ratio of first and second adjustable resistors according to a voltage correction code, thereby adjusting a terminal voltage. The terminal voltage offset correction circuit compares the terminal voltage and a third power supply voltage and provides the voltage correction code according to the comparison result. The second terminal replica model sets a resistance ratio of third and fourth adjustable resistors according to the voltage correction code and reduces an equivalent resistance value between a half-voltage terminal and a ground voltage according to a resistance correction code. The terminal resistance offset correction circuit compares a comparison voltage with a second power supply voltage and provides the resistance correction code according to the comparison result.

Another significant patent is related to dummy fin profile control to enlarge the gate process window. This method includes forming isolation regions extending into a semiconductor substrate, wherein semiconductor strips are located between the isolation regions, and forming a dielectric dummy strip between the isolation regions, recessing the isolation regions. Some portions of the semiconductor strips protrude higher than the top surfaces of the recessed isolation regions to form protruding semiconductor fins, and a portion of the dielectric dummy strip protrudes higher than the top surfaces of the recessed isolation regions to form a dielectric dummy fin. The method further includes etching the dielectric dummy fin so that a top width of the dielectric dummy fin is smaller than a bottom width of the dielectric dummy fin. A gate stack is formed on top surfaces and sidewalls of the protruding semiconductor fins and the dielectric dummy fin.

Career Highlights

Chen-Yu Wu has worked with prominent companies in the semiconductor industry, including Winbond Electronics Corporation and Taiwan Semiconductor Manufacturing Company. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Throughout his career, Chen-Yu Wu has collaborated with talented individuals such as Shih-Yao Lin and Pei