Chen-Yi Huang

Title: Innovations by Chen-Yi Huang in Semiconductor Technology

Introduction

Chen-Yi Huang is a noted inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, specifically focusing on improving processes involved in wafer processing. Huang is affiliated with the Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry.

Latest Patents

Huang holds a patent for a method and system aimed at reducing wafer edge tungsten residue, specifically titled "Method and System for Reducing Wafer Edge Tungsten Residue Utilizing a Spin Etch". This innovative approach addresses the challenges faced during chemical mechanical polishing operations of semiconductor wafers. His method outlines a sequence involving a chemical mechanical polishing operation followed by an acid etching process, which effectively removes tungsten residue accumulated on the wafer edges. The addition of a spin etch operation enhances the efficiency of residue removal, showcasing Huang's commitment to advancing semiconductor fabrication processes.

Career Highlights

Throughout his career, Chen-Yi Huang has played an integral role at Taiwan Semiconductor Manufacturing Company Limited. His expertise and inventive methods have contributed to the company's mission of providing high-quality semiconductor products. Huang's focus on precision and efficiency highlights the importance of innovation in the competitive landscape of semiconductor manufacturing.

Collaborations

Working alongside talented colleagues such as Jeng-Yang Pan and Chin-Te Huang, Chen-Yi has fostered a collaborative environment aimed at pushing technological boundaries within the semiconductor sector. Their collective expertise and ingenuity are vital in tackling the ever-evolving challenges faced in wafer processing and fabrication.

Conclusion

Chen-Yi Huang exemplifies the spirit of innovation in the field of semiconductor technology. His patented method for reducing wafer edge tungsten residue is just one example of how inventors can significantly impact their industries. As semiconductor fabrication continues to advance, contributions like Huang's will remain essential in driving efficiency and effectiveness in manufacturing processes.