Pasadena, CA, United States of America

Chen Xu

USPTO Granted Patents = 8 

Average Co-Inventor Count = 5.2

ph-index = 3

Forward Citations = 17(Granted Patents)


Location History:

  • Pasadena, CA (US) (2018 - 2021)
  • Guangdong, CN (2021)

Company Filing History:


Years Active: 2018-2021

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8 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Chen Xu

Introduction

Chen Xu is a prominent inventor based in Pasadena, CA, known for his significant contributions to the field of atomic layer deposition and etch processes. With a total of 8 patents to his name, he has made remarkable advancements that enhance critical dimension control in substrate features.

Latest Patents

Among his latest patents, Chen Xu has developed methods and apparatuses for critical dimension (CD) control of substrate features using integrated atomic layer deposition (ALD) and etch processes. One notable patent describes a technique that involves etching to form a mask pattern of features on a substrate, followed by conformally depositing a passivation layer through ALD to increase the width of the mask pattern to the desired specifications. Another innovative patent focuses on reducing roughness by depositing a conformal layer on a mask and etching the underlying layer to create patterned features with minimized roughness. These processes are performed in a plasma chamber, showcasing the advanced technology utilized in his work.

Career Highlights

Chen Xu has had a distinguished career, working with leading organizations such as Lam Research Corporation and the California Institute of Technology. His experience in these institutions has allowed him to refine his expertise in atomic layer deposition and etch processes, contributing to the advancement of semiconductor manufacturing technologies.

Collaborations

Throughout his career, Chen has collaborated with notable colleagues, including Xiang Zhou and Yoshie Kimura. These partnerships have fostered an environment of innovation and have led to the development of groundbreaking technologies in the field.

Conclusion

In summary, Chen Xu's contributions to the field of atomic layer deposition and etch processes have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in advancing critical dimension control technologies.

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