Chen-Hao Lien

Title: Innovations of Chen-Hao Lien in Semiconductor Technology

Introduction

Chen-Hao Lien is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of three patents. His work focuses on enhancing semiconductor structures and manufacturing methods, which are crucial for the advancement of electronic devices.

Latest Patents

Chen-Hao Lien's latest patents include a semiconductor structure having an electrical contact. This patent provides a detailed description of a semiconductor structure that includes a semiconductor substrate and a doped polysilicon contact. The doped polysilicon contact is strategically placed over the semiconductor substrate and contains a dopant material with a concentration of about 10 atom/cm or more. Another notable patent is a method of manufacturing a semiconductor structure with an electrical contact. This method outlines the steps of providing a semiconductor substrate, forming a dielectric structure with a trench, filling the trench with polysilicon material, detecting defects, implanting dopant material, and annealing the polysilicon to create a doped polysilicon contact.

Career Highlights

Chen-Hao Lien is currently employed at Nan Ya Technology Corporation, where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a valuable asset in the industry.

Collaborations

Some of his notable coworkers include Cheng-Yan Ji and Chu-Hsiang Hsu, who collaborate with him on various projects within the semiconductor field.

Conclusion

Chen-Hao Lien's work in semiconductor technology exemplifies the innovative spirit of modern inventors. His patents and contributions are paving the way for advancements in electronic devices and materials.