Chen-han Wang

Title: Chen-han Wang: Innovator in Semiconductor Technology

Introduction

Chen-han Wang is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

Wang's latest patents include innovative solutions for semiconductor devices. The first patent, titled "Seal material for air gaps in semiconductor devices," describes a semiconductor device that features first and second terminals formed on a fin region, with a seal layer made of silicon carbide doped with oxygen. This design includes an air gap surrounded by the seal layer, enhancing the device's functionality. The second patent, "Interconnect structure and method for manufacturing the interconnect structure," outlines a method for forming an interconnect structure that involves multiple layers and processes, including the formation of a densified dielectric layer through microwave irradiation.

Career Highlights

Chen-han Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field.

Collaborations

Wang has collaborated with notable colleagues, including Keng-Chu Lin and Khaderbad Mrunal Abhijith. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Chen-han Wang is a key figure in semiconductor innovation, with a focus on improving device performance through his patented technologies. His contributions continue to shape the future of the semiconductor industry.