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For the Inventor, By the Inventor

Austin, TX, United States of America

Chelsea Dubose

This inventor holds 14 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chelsea Dubose. Retrieved from https://idiyas.com/inventor/chelsea-dubose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 85.7

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:

goldMedal14 out of 10,883 
 
Tokyo Electron Limited
 patents

Years Active: 2019-2026

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14 patents (USPTO):Explore Patents
1. 12731762 - Method for plasma processing (2026-09-08),
2. 12719171 - Parallel resonance antenna for radial plasma control (2026-08-25),
3. 12272520 - Process control enabled VDC sensor for plasma process (2025-04-08),
4. 12224164 - Radio frequency (RF) system with embedded RF signal pickups (2025-02-11),
5. 12176183 - RF voltage and current (V-I) sensors and measurement methods (2024-12-24),
6. 12074390 - Parallel resonance antenna for radial plasma control (2024-08-27),
7. 11817296 - RF voltage and current (V-I) sensors and measurement methods (2023-11-14),
8. 11721524 - Power generation systems and methods for plasma stability and control (2023-08-08),
9. 11600474 - RF voltage and current (V-I) sensors and measurement methods (2023-03-07),
10. 11410832 - RF measurement system and method (2022-08-09),
11. 11393663 - Methods and systems for focus ring thickness determinations and feedback control (2022-07-19),
12. 11094507 - Power generation systems and methods for plasma stability and control (2021-08-17),
13. 11050394 - Modules, multi-stage systems, and related methods for radio frequency power amplifiers (2021-06-29),
14. 10510512 - Methods and systems for controlling plasma performance (2019-12-17),

Title: Chelsea Dubose - Innovator in Plasma Processing Technologies

Introduction

Chelsea Dubose is a prominent inventor based in Austin, TX (US), known for her significant contributions to plasma processing technologies. With a total of 12 patents to her name, she has made remarkable advancements in the field, particularly in the development of innovative sensors and systems.

Latest Patents

Her latest patents include a "Process control enabled VDC sensor for plasma process," which describes innovative plasma processing methods and systems that utilize direct measurement of direct current (DC) field or self-bias voltage (Vdc) in a plasma processing chamber. This invention features a non-plasma contact measurement using the electric field effect from Vdc, providing robustness to various process conditions. Additionally, she has developed a "Radio frequency (RF) system with embedded RF signal pickups," which includes a unique design of conductive covering surfaces and an insulating region for RF signal pickups.

Career Highlights

Chelsea currently works at Tokyo Electron Limited, where she continues to push the boundaries of technology in her field. Her work has been instrumental in enhancing the efficiency and effectiveness of plasma processing techniques.

Collaborations

Throughout her career, Chelsea has collaborated with notable colleagues, including Merritt Funk and Justin Moses. These partnerships have fostered a creative environment that has led to groundbreaking innovations.

Conclusion

Chelsea Dubose's contributions to the field of plasma

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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