The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Jul. 13, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Merritt Funk, Austin, TX (US);

Chelsea Dubose, Austin, TX (US);

Justin Moses, Austin, TX (US);

Kazuki Moyama, Taiwa-cho, JP;

Kazushi Kaneko, Taiwa-cho, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03F 3/68 (2006.01); H01J 37/32 (2006.01); H03F 3/21 (2006.01); H03F 1/02 (2006.01); H03F 1/56 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01); H03F 1/0288 (2013.01); H03F 1/56 (2013.01); H03F 3/21 (2013.01); H03F 2200/222 (2013.01); H03F 2200/387 (2013.01); H03F 2200/451 (2013.01);
Abstract

Embodiments are described herein for power generation systems and methods that use quadrature splitters and combiners to facilitate plasma stability and control. For one embodiment, a quadrature splitter receives an input signal and generates a first and second signals as outputs with the second signal being ninety degrees out of phase with respect to the first signal. Two amplifiers then generate a first and second amplified signals. A quadrature combiner receives the first and second amplified signals and generates a combined amplified signal that represents re-aligned versions of the first and second amplified signals. The power amplifiers can be combined into a system to generate a high power output to a processing chamber. Further, detectors can generate measurements used to monitor and control power generation. The power amplifiers, system, and methods provide significant advantages for high-power generation delivered to process chambers for plasma generation during plasma processing.


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