Che-Yung Lai

Title: The Innovations of Che-Yung Lai

Introduction

Che-Yung Lai is a prominent inventor based in Taichung County, Taiwan. He has made significant contributions to the field of thin film transistors, holding a total of five patents. His work focuses on enhancing the fabrication processes and efficiency of electronic components.

Latest Patents

One of Che-Yung Lai's latest patents is titled "Photomask and method for fabricating source/drain electrode of thin film transistor." This invention provides a method for fabricating source and drain electrodes of a thin film transistor. The process involves using a substrate with adjacent gate electrodes, coating a photoresist layer, and performing exposure and development processes to create a photoresist pattern. This pattern is then used as an etch mask to form the source and drain electrodes. Another aspect of his patent includes a photomask designed for fabricating thin film transistors, which features a translucent layer on a transparent substrate and various light-shielding layers to define channel-forming regions.

Career Highlights

Che-Yung Lai has established himself as a key figure in the field of semiconductor technology. His innovative approaches to the fabrication of thin film transistors have contributed to advancements in electronic devices. His work at Au Optronics Corporation has allowed him to collaborate with other experts in the field, further enhancing the impact of his inventions.

Collaborations

Some of Che-Yung Lai's notable coworkers include Zong-Long Jhang and Chia-Ming Chang. Their collaborative efforts have played a significant role in the development of new technologies and methodologies in the semiconductor industry.

Conclusion

Che-Yung Lai's contributions to the field of thin film transistors demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving electronic fabrication processes, making him a noteworthy inventor in the industry.