Che Wei Yang

Title: Innovations by Inventor Che Wei Yang

Introduction

Che Wei Yang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding a total of three patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is titled "Tunable Plasma Exclusion Zone in Semiconductor Fabrication." This invention provides a method for generating a plasma within a chamber of a plasma processing apparatus. It features a plasma exclusion zone (PEZ) ring that helps to exclude plasma from the edge region of a semiconductor wafer, allowing for better tuning of the plasma toward the center of the wafer.

Another significant patent is "High Reflectance Isolation Structure to Increase Image Sensor Performance." This patent describes an image sensor with a semiconductor substrate that includes a unique isolation structure. The isolation structure is designed to enhance the performance of photodetectors by incorporating a metal core and conductive liners, which improve the overall efficiency of the image sensor.

Career Highlights

Che Wei Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies in semiconductor fabrication.

Collaborations

Throughout his career, Che Wei Yang has collaborated with notable colleagues, including Sheng-Chan Li and Sheng-Chau Chen. These collaborations have further enriched his research and development efforts in the semiconductor field.

Conclusion

Che Wei Yang's innovative patents and contributions to semiconductor technology highlight his role as a key inventor in the industry. His work continues to influence advancements in semiconductor fabrication and image sensor performance.