Taipei, Taiwan

Che-Rong Liang


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 103(Granted Patents)


Company Filing History:


Years Active: 2011-2012

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4 patents (USPTO):Explore Patents

Title: Che-Rong Liang: Innovator in Semiconductor Mask Technology

Introduction

Che-Rong Liang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced mask sets for integrated circuit devices. With a total of 4 patents to his name, Liang continues to push the boundaries of innovation in this critical area of electronics.

Latest Patents

Liang's latest patents showcase his expertise in creating efficient and effective mask technologies. One of his notable inventions is the "Hybrid Multi-Layer Mask," which is designed for exposing multiple layers on a semiconductor substrate. This hybrid mask set includes a first group of multi-layer masks (MLMs) for a subset of layers, each featuring different images separated by wide image spacers. Additionally, it incorporates production-ready masks for another subset of layers, with similar images separated by narrow scribe streets.

Another significant patent is the "Multiple Technology Node Mask," which outlines a method for fabricating a mask set. This method involves providing mask data associated with various mask layers, including patterns for different technology nodes. The innovation lies in forming a multi-technology node mask (MTM) that combines features from both the first and second patterns, enhancing the versatility and efficiency of the mask layers.

Career Highlights

Che-Rong Liang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with some of the brightest minds in the field, further advancing his research and innovations.

Collaborations

Liang has worked alongside talented colleagues such as Fei-Gwo Tsai and Feng-Lung Lin. Their collaborative efforts have contributed to the successful development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Che-Rong Liang's contributions to semiconductor mask technology are noteworthy and impactful. His innovative patents and collaborations reflect his commitment to advancing the field and enhancing the capabilities of integrated circuit devices.

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