The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Mar. 27, 2008
Feng Lung Lin, Hsinchu, TW;
Kuan Liang Wu, Taipei, TW;
Fei-gwo Tsai, Hsinchu, TW;
Che-rong Liang, Taipei, TW;
Feng Lung Lin, Hsinchu, TW;
Kuan Liang Wu, Taipei, TW;
Fei-Gwo Tsai, Hsinchu, TW;
Che-Rong Liang, Taipei, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A multiple technology node mask (MTM) is provided. An MTM includes a pattern associated with a first technology node and a pattern associated with a second technology node. The first technology node and the second technology node may be different. For example, the first technology node may be a main node and the second technology node a sub-node. A mask set including an MTM may also include single technology node masks (STMs) for mask layers in which the first technology node and second technology node and/or the patterns associated with each are not compatible. A single mask set including MTM and STMs, may be used to produce a plurality of devices, each on a different wafer.