Dallas, TX, United States of America

Charlotte M Appel

This inventor holds 1 USPTO granted patent. Top assignee: Texas Instruments Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Charlotte M Appel. Retrieved from https://idiyas.com/inventor/charlotte-m-appel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Charlotte M Appel: Innovator in Silicon Processing Technology

Introduction

Charlotte M Appel is a distinguished inventor based in Dallas, TX (US). She has made significant contributions to the field of silicon processing, particularly through her innovative patent that addresses the challenges of maintaining silicon surface integrity during processing.

Latest Patents

Charlotte M Appel holds a patent for a silicon processing method. This plasma process is designed to produce an undamaged and uncontaminated silicon surface. It achieves this by consuming silicon through continuous oxidation via a surface oxide layer while simultaneously etching the exposed silicon oxide surface. The thickness of the silicon dioxide layer is carefully controlled, balancing oxide growth from oxygen atoms and etching of the oxide surface. This protective layer safeguards the silicon surface from plasma damage and contamination.

Career Highlights

Charlotte is currently employed at Texas Instruments Corporation, where she applies her expertise in silicon processing. Her work has been instrumental in advancing the technology used in semiconductor manufacturing.

Collaborations

Some of her notable coworkers include Antonio L P Rotondaro and Rebecca J Gale, who have collaborated with her on various projects within the company.

Conclusion

Charlotte M Appel's innovative work in silicon processing exemplifies her commitment to advancing technology in the semiconductor industry. Her contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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