Charles C Havener

Title: Innovations of Charles C. Havener

Introduction

Charles C. Havener is an accomplished inventor based in Knoxville, TN (US). He has made significant contributions to the field of ion beam technology, holding a total of 2 patents. His work focuses on methods and apparatus that enhance the efficiency and accuracy of ion beam applications.

Latest Patents

Havener's latest patents include a "Method and apparatus for efficient photodetachment and purification of negative ion beams." This invention describes a method for purifying an ion beam by inputting it into a gas-filled multipole ion guide. The process involves collisional cooling to increase laser-ion interaction time, allowing for the selective removal of contaminants from the ion beam through electron photodetachment. Another notable patent is the "Beam profile monitor with accurate horizontal and vertical beam profiles." This innovation modifies a widely used scanner device by adding a second wire probe, resulting in more accurate beam profiles and measurements of beam divergence and quality.

Career Highlights

Havener is currently employed at UT-Battelle, Inc., where he continues to advance his research and development in ion beam technologies. His work has been instrumental in improving the efficiency of ion beam applications, which are critical in various scientific and industrial fields.

Collaborations

Throughout his career, Havener has collaborated with notable colleagues, including Riad Al-Rejoub and James R. Beene. These partnerships have contributed to the successful development of his innovative technologies.

Conclusion

Charles C. Havener's contributions to ion beam technology through his patents and collaborations highlight his role as a significant inventor in this field. His work continues to influence advancements in ion beam applications, showcasing the importance of innovation in scientific research.