The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7335878 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 26, 2008

Filed:

Oct. 17, 2005
Applicants:

James R. Beene, Oak Ridge, TN (US);

Yuan Liu, Knoxville, TN (US);

Charles C. Havener, Knoxville, TN (US);

Inventors:

James R. Beene, Oak Ridge, TN (US);

Yuan Liu, Knoxville, TN (US);

Charles C. Havener, Knoxville, TN (US);

Assignee:

UT-Battelle LLC, Oak Ridge, TN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 49/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and apparatus are described for efficient photodetachment and purification of negative ion beams. A method of purifying an ion beam includes: inputting the ion beam into a gas-filled multipole ion guide, the ion beam including a plurality of ions; increasing a laser-ion interaction time by collisional cooling the plurality of ions using the gas-filled multipole ion guide, the plurality of ions including at least one contaminant; and suppressing the at least one contaminant by selectively removing the at least one contaminant from the ion beam by electron photodetaching at least a portion of the at least one contaminant using a laser beam.


Find Patent Forward Citations

Beene, James. (2008). Method and apparatus for efficient photodetachment and purification of negative ion beams (U.S. Patent No. 7335878). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7335878

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…