Company Filing History:
Years Active: 2005-2008
Title: Chaoyong Li: Innovator in Semiconductor Technology
Introduction
Chaoyong Li is a prominent inventor based in Singapore, known for his contributions to semiconductor technology. With a total of 3 patents, he has made significant advancements in the field, particularly in the area of composite diffusion barriers in copper/organic low-k damascene technology.
Latest Patents
One of his latest patents involves a process of forming a composite diffusion barrier in semiconductor devices. This innovation includes a substrate with a dielectric layer that has an opening exposing a portion of the substrate. The composite barrier layer consists of a dielectric flash layer, an aluminum layer, and a barrier metal layer, which work together to enhance the performance of semiconductor devices. Another patent details a method for forming a composite barrier layer, outlining steps that include the formation of a dielectric flash layer and the subsequent layering of aluminum and barrier metal to create a robust composite barrier.
Career Highlights
Chaoyong Li is affiliated with the Agency for Science, Technology and Research, where he applies his expertise in semiconductor technology. His work has been instrumental in developing innovative solutions that address challenges in the semiconductor industry.
Collaborations
Chaoyong has collaborated with notable colleagues, including Siaw Suian Sabrina Su and Moitreyee Mukherjee-Roy, contributing to a dynamic research environment that fosters innovation.
Conclusion
Chaoyong Li's work in semiconductor technology exemplifies the impact of innovation in modern electronics. His patents and collaborations highlight his commitment to advancing the field and improving device performance.