Company Filing History:
Years Active: 2017-2020
Title: Innovations of Chao-Wei Wu
Introduction
Chao-Wei Wu is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, his work focuses on advanced methods for fabricating semiconductor devices.
Latest Patents
Chao-Wei Wu's latest patents include a method of fabricating a semiconductor device. This method involves forming a gate structure on a semiconductor substrate and performing a photolithography process with a mask that has two transparent regions. The process results in a photoresist layer with two openings, allowing for the formation of lightly doped drain regions through ion implantation. Another significant patent is for a high-voltage semiconductor device. This device features a semiconductor substrate with a well region of a first conductivity type and an isolation structure. The design includes first and second gate structures and implant regions, enhancing the device's performance.
Career Highlights
Chao-Wei Wu is currently employed at Vanguard International Semiconductor Corporation. His work at this company has been instrumental in advancing semiconductor technologies. His innovative approaches have contributed to the development of high-performance semiconductor devices.
Collaborations
Chao-Wei Wu has collaborated with notable coworkers such as Chih-Wei Lin and Pi-Kuang Chuang. These collaborations have fostered a productive environment for innovation and development in semiconductor technology.
Conclusion
Chao-Wei Wu's contributions to semiconductor technology through his patents and work at Vanguard International Semiconductor Corporation highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future innovations.