Chao Wang

Ossining, NY, United States of America

Chao Wang

USPTO Granted Patents = 37 

Average Co-Inventor Count = 3.9

ph-index = 5

Forward Citations = 85(Granted Patents)


Location History:

  • Chandler, NY (US) (2016 - 2018)
  • Yorktown Heights, NY (US) (2017 - 2019)
  • Ossining, NY (US) (2014 - 2020)
  • Chandler, AZ (US) (2017 - 2024)

Company Filing History:


Years Active: 2014-2025

where 'Filed Patents' based on already Granted Patents

37 patents (USPTO):

Title: Chao Wang: Innovator in Polarimetric Imaging and Nanopore Sensors

Introduction

Chao Wang, based in Ossining, NY, is a prolific inventor with an impressive portfolio of 36 patents. His work primarily focuses on advanced sensing technologies, contributing significantly to the fields of polarimetric imaging and nanopore sensor fabrication. With a strong academic and professional background, Chao has made notable advancements that hold the potential for various applications across multiple industries.

Latest Patents

Chao Wang's recent patents showcase his innovative approaches in sensor technology. One significant patent is for an on-chip polarization detection and polarimetric imaging system. This invention describes a method for fabricating a polarization sensor that utilizes a quarter-wave plate to convert circularly polarized light into linearly polarized light. The quarter-wave plate is crafted as a metasurface, improving sensor functionality. Additionally, the sensor includes a linear polarizer and a photodetector that work collectively to analyze and receive the light, allowing for complete measurement of the polarization state of incident light through combinations with other linear polarization sensors.

Another notable patent involves low-capacitance nanopore sensors on insulating substrates. This patent outlines the fabrication process of a nanopore sensor, which includes depositing oxide layers on a sapphire substrate, utilizing patterned etch masks, and performing a crystalline orientation-dependent wet anisotropic etch. The result is a cavity with sloped side walls that align with the crystalline planes of the sapphire substrate. This detailed process culminates in the development of a silicon nitride membrane with an opening, allowing for high-performance sensing capabilities.

Career Highlights

Chao Wang's career is marked by significant contributions while working with esteemed companies. He has been associated with the International Business Machines Corporation (IBM) and has collaborated with the Arizona Board of Regents on behalf of Arizona State University. His tenure in these institutions has enabled him to push the boundaries of research and innovation in sensor technologies.

Collaborations

Throughout his career, Chao has collaborated with distinguished colleagues, including Gustavo Alejandro Stolovitzky and Deqiang Wang. These partnerships have facilitated the advancement of his research projects and led to innovative solutions in sensor design and application.

Conclusion

Chao Wang stands out as a key figure in the domain of sensor technology, with a remarkable collection of patents that highlight his inventive spirit and technical proficiency. His latest contributions in polarimetric imaging and nanopore sensors reflect a commitment to advancing scientific knowledge and practical applications in the rapidly evolving technological landscape. As a visionary inventor, Chao's work continues to inspire the next generation of innovations.

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