The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Apr. 12, 2016
International Business Machines Corporation, Armonk, NY (US);
Jingwei Bai, Los Angeles, CA (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Gustavo A. Stolovitzky, Riverdale, NY (US);
Chao Wang, Ossining, NY (US);
Deqiang Wang, Ossining, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORTAION, Armonk, NY (US);
Abstract
A technique includes forming a gradient channel with width and depth gradients. A mask is disposed on top of a substrate. The mask is patterned with at least one elongated channel pattern having different elongated channel pattern widths. A channel is etched in the substrate in a single etching step, the channel having a width gradient and a corresponding depth gradient both simultaneously etched in the single etching step according to the different elongated channel pattern widths in the mask.