Chao-Chen Cheng

Title: Chao-Chen Cheng: Innovator in Photomask Technology

Introduction

Chao-Chen Cheng is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of photomask technology, particularly through his innovative patents. With a total of 2 patents, Cheng has established himself as a key figure in the semiconductor industry.

Latest Patents

Cheng's latest patents focus on the development of attenuating phase shifting photomasks. One of his notable inventions involves using (LaNiO.sub.3).sub.X (TiO.sub.2).sub.1-X and (LaNiO.sub.3).sub.X to create a composite material that combines the optical properties of LaNiO.sub.3, a material with a high extinction coefficient, and either TiO.sub.2 or Ta.sub.2 O.sub.5, which has a high index of refraction. This innovative approach allows for the formation of attenuating phase shifting blanks and masks through co-deposition techniques using rf-magnetron sputtering on transparent quartz substrates.

Career Highlights

Chao-Chen Cheng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of photomask technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.

Collaborations

Cheng has collaborated with notable colleagues in his field, including Chih-Chiang Tu and Jon-Yiew Gan. These partnerships have further enhanced his research and development efforts.

Conclusion

Chao-Chen Cheng's contributions to photomask technology and his innovative patents have made a significant impact on the semiconductor industry. His work exemplifies the importance of innovation in advancing technology and improving manufacturing processes.