Singapore, Singapore

Changwei Pei

This inventor holds 1 USPTO granted patent. Top assignee: Globalfoundries Singapore Pte. Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Changwei Pei. Retrieved from https://idiyas.com/inventor/changwei-pei

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovations of Changwei Pei in Semiconductor Processing

Introduction

Changwei Pei is an esteemed inventor based in Singapore, recognized for his contributions to semiconductor technology. With a focus on enhancing the processing methods involved in semiconductor device fabrication, he holds a patent that demonstrates his innovative approach to addressing the challenges within this field.

Latest Patents

Changwei Pei's notable patent, titled "Methods for removal of hard mask," presents a unique method for processing semiconductor devices. The patented process involves preparing a substrate that features isolation regions with non-planar surface topology, specifically designed to accommodate both memory and logic regions. A hard mask layer is strategically formed across these regions, allowing for selective processing. The innovation advances the capability to effectively remove hard mask residue while protecting non-select regions during the procedure, showcasing its potential impact on the efficiency and reliability of semiconductor manufacturing.

Career Highlights

Currently, Changwei Pei is part of GlobalFoundries Singapore Pte. Ltd., a leading company in semiconductor manufacturing. His role within the organization allows him to collaborate with cutting-edge teams and further develop his inventions, contributing significantly to the advancement of industry standards.

Collaborations

In his professional journey, Changwei has had the opportunity to work alongside prominent colleagues, including Liang Li and Yun Ling Tan. Their collaboration fosters an environment of creativity and innovation, driving the development of new solutions in semiconductor technologies.

Conclusion

Changwei Pei’s inventive spirit and dedication to addressing industry challenges have led him to create valuable innovations in semiconductor processing. His patented method for the removal of hard masks not only exemplifies his technical expertise but also positions him as a significant contributor to the advancement of the semiconductor industry. As technology continues to evolve, Changwei's contributions will undoubtedly play an important role in shaping the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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