Seoul, South Korea

Changman Moon

This inventor holds 1 USPTO granted patent. Top assignee: Nova Measuring Instruments Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Changman Moon. Retrieved from https://idiyas.com/inventor/changman-moon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Changman Moon - Innovator in Overlay Design Optimization

Introduction

Changman Moon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of overlay design optimization, showcasing his expertise through his innovative patent.

Latest Patents

Changman Moon holds a patent for an overlay design optimization technique. This patent involves a sample comprising an overlay target, which includes at least one pair of patterned structures. These structures are situated in the bottom and top layers of the sample, maintaining a specific vertical distance between them. The design optimizes at least one pattern parameter for a predetermined optical overlay measurement scheme within a specific wavelength range. This innovation highlights his commitment to advancing technology in this area.

Career Highlights

Changman Moon is currently employed at Nova Measuring Instruments Ltd., where he continues to develop and refine his ideas. His work at this company has allowed him to focus on cutting-edge technologies that enhance measurement accuracy in various applications.

Collaborations

Throughout his career, Changman has collaborated with talented individuals such as Gilad Barak and Tal Verdene. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Changman Moon's contributions to overlay design optimization exemplify his dedication to innovation in technology. His patent and work at Nova Measuring Instruments Ltd. reflect his significant impact on the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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