The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Feb. 16, 2015
Applicant:
Nova Measuring Instruments Ltd., Rehovot, IL;
Inventors:
Gilad Barak, Rehovot, IL;
Tal Verdene, Hulda, IL;
Michal Yachini, Rehovot, IL;
Dror Shafir, Kiryat Ono, IL;
Changman Moon, Seoul, KR;
Shay Wolfling, Kiryat Ono, IL;
Assignee:
NOVA MEASURING INSTRUMENTS LTD., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); H01L 21/67 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); G06F 17/5072 (2013.01); G03F 7/70641 (2013.01); H01L 21/0273 (2013.01); H01L 21/67294 (2013.01); H01L 29/66553 (2013.01);
Abstract
A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.