Company Filing History:
Years Active: 2023
Title: Changhung Kung: Innovator in Semiconductor Manufacturing
Introduction
Changhung Kung is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor devices.
Latest Patents
Changhung Kung's latest patents include a method for manufacturing a semiconductor device that involves providing a substrate with an amorphous silicon layer. This method includes forming an etching auxiliary layer on the amorphous silicon layer, ensuring that the upper surface is flat. The process allows for etching the amorphous silicon layer to achieve a target thickness while maintaining a flat upper surface. Another patent details a method for manufacturing a semiconductor device that includes forming a first gate structure for a dense area transistor and a second gate structure for an isolated area transistor on a substrate. This innovative approach involves creating a buffer layer and removing the top of the first gate structure to enhance device performance.
Career Highlights
Changhung Kung is currently employed at Shanghai Huali Integrated Circuit Corporation, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise and innovative mindset have positioned him as a key player in the industry.
Collaborations
Changhung has collaborated with notable colleagues, including Xiumei Hu and Jianxun Chen, contributing to various projects that advance semiconductor technology.
Conclusion
Changhung Kung's contributions to semiconductor manufacturing through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the development of advanced semiconductor devices.