Chang-Ting Chung

Title: Chang-Ting Chung: Innovator in Semiconductor Technology

Introduction

Chang-Ting Chung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work focuses on methods for enhancing semiconductor device performance.

Latest Patents

Among his latest patents is a method for forming contact features of semiconductor devices. This method involves creating a dielectric layer over an epitaxial source/drain region, followed by the formation of an opening that exposes part of the region. A barrier layer is then applied, and an oxidation process transforms portions of the barrier and dielectric layers. The process concludes with filling the opening with a conductive material in a bottom-up manner, ensuring physical contact with the liner layer. Another notable patent details a method of fabricating a contact structure, which includes forming an opening in a dielectric layer and creating a conductive material layer with varying thicknesses. This method also involves treatments to form and remove oxide layers, resulting in equal thickness across the conductive material.

Career Highlights

Chang-Ting Chung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor industry. His work has been instrumental in advancing the technology used in modern electronic devices.

Collaborations

He has collaborated with notable colleagues, including Chun-Hsien Huang and Wei-Jung Lin, contributing to various projects that enhance semiconductor technology.

Conclusion

Chang-Ting Chung's innovative contributions to semiconductor technology and his collaborative efforts with esteemed colleagues underscore his importance in the field. His patents reflect a commitment to advancing technology and improving device performance.