This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Chang-Ta Chen: Innovator in Spacer Technology
Introduction
Chang-Ta Chen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of spacer structures used in various applications.
Latest Patents
Chang-Ta Chen holds a patent for a device with a replacement spacer structure. This invention provides a method for forming such a structure, which includes creating an initial spacer structure with a specific etch rate for a selected etchant. The process involves removing a portion of the initial spacer structure while retaining a remaining portion. Subsequently, a replacement spacer structure is formed adjacent to the remaining portion, resulting in a combined spacer structure with an intermediate etch rate that is less than the initial etch rate. The final step involves etching the combined spacer structure to create a final spacer structure.
Career Highlights
Chang-Ta Chen is associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has contributed to advancements in manufacturing processes and materials used in semiconductor devices.
Collaborations
Some of his notable coworkers include Chun-Ming Yang and Ya-Ting Yang, who have collaborated with him on various projects within the semiconductor field.
Conclusion
Chang-Ta Chen's innovative work in spacer technology exemplifies the importance of advancements in semiconductor manufacturing. His contributions continue to influence the industry and pave the way for future innovations.