This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2016-2023.
Company Filing History:
Years Active: 2016-2023
Title: Chang-Shen Lu: Innovator in Semiconductor Technology
Introduction
Chang-Shen Lu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of integrated circuit (IC) fabrication systems.
Latest Patents
One of his latest patents is for a wafer susceptor with improved thermal characteristics. This innovative IC fabrication system is designed to facilitate improved thermal uniformity during the processing of substrates. The system includes a chamber where the IC process occurs, a heating mechanism to heat the substrate, and a substrate-retaining device that holds the substrate in place. The design of the substrate-retaining device is particularly noteworthy, as it features a contact surface that engages the edge of the retained substrate without making contact with its circumferential surface. This device incorporates multiple contact and noncontact regions, enhancing its functionality. Additionally, the substrate-retaining device can include a base portion with a circular surface and a cylindrical surface, further optimizing its design.
Career Highlights
Chang-Shen Lu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role at the company allows him to apply his innovative ideas and contribute to advancements in semiconductor technology.
Collaborations
Throughout his career, Chang-Shen Lu has collaborated with notable colleagues, including Yi-Hung Lin and Tze-Liang Lee. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Chang-Shen Lu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of more efficient IC fabrication systems.