Daejeon, South Korea

Chang-Seok Lee

This inventor holds 18 USPTO granted patents and 1 published patent application, plus 2 CIPO patents and 2 EPO patents, primarily in Semiconductor Devices. Top assignees: Samsung Electronics Co., Ltd., Electronics and Telecommunications Research Institute, Lg Life Sciences, Limited. Active years: 1994-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang-Seok Lee. Retrieved from https://idiyas.com/inventor/chang-seok-lee-i7tm5oux

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18 

% Patents Active = 72.2

 

 

Average Co-Inventor Count = 4.7

ph-index = 6

Forward Citations = 98(Granted Patents)


Location History:

  • Daejeon-shi, KR (1994)
  • Daeion-Shi, KR (1999)
  • Daejon, KR (2007)
  • Daejeon, KR (1995 - 2013)
  • Cheonan-si, KR (2013 - 2014)
  • Chungcheongnam-do, KR (2017)
  • Seoul, KR (2013 - 2022)

Company Filing History:


Years Active: 1994-2022

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Areas of Expertise:
Plasma Deposition
Wireless Charging
Communication System
Dipeptidyl Peptidase-IV
Impulse Generator
Self-Calibration
Analog Correlator
Power Amplifier
Low Noise Amplifier
Semiconductor Device
Mobile Transceiver
Integrated Circuit
18 patents (USPTO):Explore Patents

Title: Innovations of Chang-Seok Lee

Introduction

Chang-Seok Lee is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the fields of semiconductor manufacturing and communication systems. With a total of 18 patents to his name, Lee's work has had a substantial impact on technology and innovation.

Latest Patents

Among his latest patents are a plasma deposition method and a plasma deposition apparatus for manufacturing semiconductor devices. In this plasma deposition method, a substrate is loaded onto a substrate stage within a chamber. A first plasma is generated at a region separated from the substrate by a first distance. A first process gas is supplied to the first plasma region to perform a pre-treatment process on the substrate. A second plasma is generated at a region separated from the substrate by a second distance, which is different from the first distance. A second process gas is supplied to the second plasma region to perform a deposition process on the substrate. Another notable patent involves a communication system and operating method using a home gateway. This method includes transmitting a service request signal using the home gateway to an adjacent node, receiving information of at least one home gateway of another user from the adjacent node, and transmitting and receiving signals to and from that home gateway.

Career Highlights

Chang-Seok Lee has worked with leading companies in the technology sector, including Samsung Electronics Co., Ltd. and the Electronics and Telecommunications Research Institute. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in the industry.

Collaborations

Lee has collaborated with notable colleagues such as Hyung-Moo Park and Young-hwan Kim. Their joint efforts have contributed to advancements in their respective fields and have fostered a collaborative environment for innovation.

Conclusion

Chang-Seok Lee's contributions to technology through his patents and collaborations highlight his role as a key innovator in the semiconductor and communication sectors. His work continues to influence advancements in these critical areas.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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