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For the Inventor, By the Inventor

Sungnam-si, South Korea

Chang-Ki Hong

USPTO Granted Patents = 13

Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 86(Granted Patents)


Location History:

  • Kyunggi-do, KR (2001)
  • Yongin-shi, KR (2003)
  • Suwon-shi, KR (2004)
  • Seoul, KR (2005 - 2008)
  • SeongNam, KR (2008)
  • Sungnam-si, KR (2006 - 2014)

Company Filing History:

goldMedal13 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal1 out of 96 
 
Pukyong National University
 patents
where one patent can have more than one assignee

Years Active: 2001-2014

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13 patents (USPTO):Explore Patents
1. 8790470 - Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods (2014-07-29),
2. 8585917 - Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods (2013-11-19),
3. 8084367 - Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods (2011-12-27),
4. 7413959 - Semiconductor device including a planarized surface and method thereof (2008-08-19),
5. 7344999 - Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor device (2008-03-18),
6. 7309683 - Cleaning composition and method of cleaning a semiconductor device using the same (2007-12-18),
7. 7244649 - Method of manufacturing a capacitor having improved capacitance and method of manufacturing a semiconductor device including the capacitor (2007-07-17),
8. 7097545 - Polishing pad conditioner and chemical mechanical polishing apparatus having the same (2006-08-29),
9. 6863592 - Chemical/mechanical polishing slurry and chemical mechanical polishing method using the same (2005-03-08),
10. 6858452 - Method for isolating self-aligned contact pads (2005-02-22),
11. 6709920 - Method of fabricating a non-volatile memory device having a tunnel-insulating layer including more than two portions of different thickness (2004-03-23),
12. 6642105 - Semiconductor device having multi-gate insulating layers and methods of fabricating the same (2003-11-04),
13. 6169002 - Methods of forming trench isolation structures by etching back electrically insulating layers using etching masks (2001-01-02),

Title: Chang-Ki Hong: Pioneering Innovations in Semiconductor Technology

Introduction

Chang-Ki Hong is a prominent inventor based in Sungnam-si, South Korea. With an impressive portfolio of 13 patents, he has significantly contributed to the field of semiconductor technology. His inventions focus on advanced methods that improve processing efficiency and effectiveness in manufacturing semiconductor devices.

Latest Patents

Among his recent innovations, Chang-Ki Hong has developed etching, cleaning, and drying methods that utilize supercritical fluid. These methods include a novel chamber system designed for conducting such operations. Specifically, his etching technique employs supercritical carbon dioxide, which dissolves an etching chemical to etch material layers. Furthermore, it effectively removes by-products from the reaction between the material layer and the etching chemical using a cleaning chemical, also dissolved in supercritical carbon dioxide. This cutting-edge methodology is instrumental in manufacturing semiconductor devices, showcasing his commitment to enhancing technological processes.

Career Highlights

Chang-Ki Hong's career is marked by significant contributions while working at leading organizations, including Samsung Electronics Co., Ltd. and Pukyong National University. His role in these institutions has allowed him to collaborate on various research projects, leading to exceptional advancements in semiconductor technology.

Collaborations

Throughout his career, Chang-Ki Hong has collaborated with distinguished colleagues in the field, notably Jae-Dong Lee and Woo-Gwan Shim. These partnerships have fostered innovative research and development efforts, amplifying the impact of his inventions within the semiconductor industry.

Conclusion

In conclusion, Chang-Ki Hong stands out as an influential inventor whose work in etching and cleaning methods using supercritical fluids is setting new standards in semiconductor device manufacturing. His extensive patent portfolio reflects his passion for innovation and his commitment to advancing technology in this critical field. As he continues to push the boundaries of what is possible, the contributions of Chang-Ki Hong will undoubtedly play a pivotal role in shaping the future of semiconductor technology.

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