Company Filing History:
Years Active: 2024-2025
Title: Chang Hun Kim: Innovator in Substrate Processing Technologies
Introduction
Chang Hun Kim is a notable inventor based in Osan-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of processing chambers.
Latest Patents
Chang Hun Kim's latest patents include an internal chamber processing method and a substrate processing method. The internal chamber processing method is designed to perform processing on a chamber and its components. This method involves a pressurizing operation that raises the pressure inside the chamber to a level higher than atmospheric pressure using a pressurized gas. Following this, a depressurizing operation lowers the pressure back down after the substrate has been removed from the chamber.
The substrate processing method also features a pressurizing operation that increases the process pressure from a first to a second pressure, both above atmospheric levels. This is followed by a depressurizing operation and an annealing operation that changes the process pressure according to a preset pattern, all while maintaining a temperature higher than room temperature.
Career Highlights
Chang Hun Kim is currently employed at Wonik IPS Co., Ltd., where he continues to develop and refine his innovative processing methods. His work has positioned him as a key figure in the advancement of substrate processing technologies.
Collaborations
He collaborates with talented coworkers, including Ah Young Hwang and Won Jun Jang, who contribute to the innovative environment at Wonik IPS Co., Ltd.
Conclusion
Chang Hun Kim's contributions to substrate processing through his patented methods demonstrate his commitment to innovation in the field. His work not only enhances processing efficiency but also sets a foundation for future advancements in technology.